|
Technology and Materials |
S.N. Agbo et al. (Delft University of Technology)
Effect of deposition parameters of μc-Si:H solar cell absorber layer on spectral response
|
E. Angelopoulos et al. (Institute for Microelectronics Stuttgart)
Porous Silicon for Micro- and Opto-electronic applications: Fabrication technology and post-processing steps
|
A. Baiano et al. (Delft University of Technology)
Germanium Grains Location Control using μ-Czochralski Process
|
A. Boogaard et al. (University of Twente, NXP Research)
Deposition of High-Quality SiO2 Insulating Films at Low Temperatures by means of Remote PECVD
|
Y. Civale et al. (Delft University of Tehnology)
On the Aluminum-Mediated Solid-Phase Epitaxy of Silicon at 300°C
|
J. Derakhshandeh et al. (Delft University of Technology)
Optimizing Chemical Mechanical Polishing process in 3D-IC
|
A. FirrincieliI et al. (IMEC, KU Leuven)
Schottky to Ohmic transition in Pd/Ge Contacts on n-GaAs
|
A.W. Groenland et al. (University of Twente)
Thermal and plasma-enhanced oxidation of ALD TiN
|
L. Gu et al. (Delft University of Technology)
Design rules for patterning in deep cavities formed by TMAH-etching of Si
|
O. Isabella et al. (Delft University of Technology, University of Ljubljana)
Light Scattering Properties of Periodic and Randomly Surface-Textured Substrates For Thin-Film Solar Cells
|
G. Lorito et al. (Delft University of Technology)
Reduction of alloying temperature of metallization stacks containing Al/Ti/TiN from 400 to 300°C
|
J. Lu et al. (University of Twente)
Functional layers for CIGS Solar Cell on-chip fabrication during post-processing
|
J. Melai et al. (University of Twente, NXP Semiconductors)
Further outgassing studies on SU-8
|
M. Popadić et al. (Delft University of Technology)
Ultrashallow Defect-Free Junction Formation by Excimer Laser Annealing
|
D. Roy et al. (NXP-TSMC Research Center, Philips Research)
Influence of interfacial layer on Contact Resistance
|
S. Russo et al. (Delft University of Technology, University of Naples)
Impact of Aluminum Nitride Heatspreaders on the Thermal Impedance of Silicon-on-Glass BJTs
|
M.P.J. Tiggelman et al. (University of Twente)
The trade-off between tuning ratio and quality factor of BaxSr1-xTiO3 MIM capacitors on alumina substrates
|
B. Vet et al. (Delft University of Technology)
Optimization of the a-SiC:H p-i interface layer in p-i-n a-Si:H solar cells
|
F. Wali et al. (University of Twente, NXP semiconductors)
Liquid-borne nano particles impact on the random yield during critical processes in IC’s production
|
M.A. Wank et al. (Delft University of Technology, Eindhoven University of Technology)
Surface roughness analysis of ETP-CVD a-Si:H thin films deposited at high growth rates around 1 nm/s
|
J. Westra et al. (Delft University of Technology)
Thin-film crystalline silicon on glass
|
C.K. Yang et al. (Delft University of Technology, Kavli Institute of Nanoscience)
Further investigation of hydrogen silsesquioxane e-beam resist as etching mask for cryogenic silicon etching
|
M. Zimmerman et al. (Institute for Microelectronics Stuttgart)
Ultra-Thin Chip Fabrication and Assembly Process
|