Tailored ALD layer properties for Sensing Applications (10026)

Project nummer: 10026

Omschrijving van het onderzoek

The research proposed here aims at enhancing the optical properties, while controlling the mechanical and structural properties of thin films deposited by atomic layer deposition (ALD) to enable the development of new optical based sensors in the ultraviolet (UV) domain for biomedical and environmental applications.

The operation in the UV domain is of great relevance because it facilitates the detection of small local environmental changes as absorption levels in that domain are high. However, the lack of suitable techniques and materials with the required properties has hampered their development. This problem can be overcome by the use of ALD technique that provides thin controlled layers with a smooth surface, high refractive index and low tensile stress level. These are essential conditions to develop a new range of nanophotonic devices, such as photonic crystal waveguides (PC-WG) and evanescent wave sensors (EWS), capable of achieving a sensitivity enhancement of up to 30% compared to available sensors. Furthermore, by using ALD, these layers can be deposited at low temperature, thus allowing post-process integration of these structures in IC processes.

Gebruikers

No users' committee has been installed, yet.

Projectleider

Prof.dr. P.M. Sarro
Technische Universiteit Delft
Delfts Instituut voor Micro-Elektronica en Submicrontechnologie
Postbus 5031
2600 GA Delft

Status van het project

Startdatum:	Dit project is nog niet gestart
Einddatum:

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