Atomic layer deposition as an enabling ultrathin film technology (10018)

Project nummer: 10018

Omschrijving van het onderzoek

The method of atomic layer deposition (ALD), and in particular plasma-assisted ALD, as a deposition technique for ultrathin films will be investigated. A unique attribute of ALD is the use of sequential self-limiting surface reactions to achieve conformal films with sub-monolayer thickness control. This makes ALD of interest in many advanced technologies that require control of film properties on the nanometer scale. A project is therefore proposed to further exploit the merits of ALD as an enabling ultrathin film technology for a wider range of industrial applications. The research will mostly be directed at plasma-assisted ALD and it will be benchmarked against thermal ALD. The research will have a primary focus on (I) the understanding of the underlying reaction mechanisms by appling an extensive set of online process diagnostics; (II) tool and process development for a wide variety of materials and applications; and (III) validation of the merits offered by plasma-assisted ALD and exploration of new applications by demonstrator experiments. To address these strongly linked themes, the experimental approach taken will be aimed at reducing "trial-and-error" and will encompass the full research chain including fundamentals and applications. A set of selected challenging research topics will be addressed in collaboration with the project partners: (1) the deposition of rare earth and alkaline earth (ultrahigh-k) oxides; (2) the deposition of low-resistivity ultrathin metal films; (3) the development of low-temperature ALD processes; and (4) the development of online process diagnostics dedicated for ALD. Because plasma-assisted ALD is a rather new technique, it is anticipated that the work will contribute significantly to several innovations in thin film technology and its applications.

Gebruikers

No users' committee has been installed, yet.

Projectleider

Dr.ir. Erwin Kessels
Technische Universiteit Eindhoven
Faculteit Technische Natuurkunde
Plasma & Materials Processing (PMP) Group
Postbus 513
5600 MB Eindhoven

Status van het project

Startdatum:	dit project is nog niet gestart
Einddatum:

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