Conductivity Control in Metallic Nanolayers (10017)

Project nummer: 10017

Omschrijving van het onderzoek

A conducting film of only a few-nanometer thickness shows an extremely steep conductivity dependence on the layer thickness and morphology. In this project, we will explore Atomic layer Deposition (ALD) approach to deposit ultra-thin metal-like films. Starting from studying the dependence of the nuclei density/size on ALD process parameters, we will further focus on the relation between these parameters and the layer properties and quality. Extra attention will be paid to the role of the surface for deposition. The next step will be to study a variety of electrical conductivity effects for differently-thin films, with three applications in mind such as secret keys based on Physical Unclonable Functions (PUF), Nano-Crystal Non-Volatile (NCNV) Memories, and Field Effect (FE) devices. Based on this, we will finally obtain a fundamental knowledge of the targeted film deposition processes and evaluate the feasibility of implementation of the ultra-thin conducting films in the targeted devices.

Gebruikers

No users' committee has been installed, yet.

Projectleider

Dr. A.Y. Kovalgin
Universiteit Twente
MESA+ Research Institute for Nanotechnology
Postbus 217
7500 AE Enschede

Status van het project

Startdatum:	Dit project is nog niet gestart
Einddatum:

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Nieuws uitgelicht

Nieuwsbrief Technologiestichting STW, januari 2012

31 januari 2012

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