Laser Interference Lithography: for submicron magnetic, optical and micromechanic devices (05554)

Project nummer: 05554

Omschrijving van het onderzoek

In this project, we have brought the technology of Laser Interference Lithography (LIL) at the MESA+ research institute at an advanced level and used it to solve problems in high density magnetic recording, bio filtering and integrated optics. This combined effort of three MESA+ research groups allowed us to built an instrument which is comparable to the best in the world. In Laser Interference Lithography, the interference pattern of two intersecting laser beams is used to expose a very thin resist. Of course one can only create gratings (and arrays by multiple exposure), but the grating period can be as small as half the laser-wavelength, and complete wafers can be exposed in within 40 seconds. This gives this technique a big advantage over for instance e-beam lithography, if gratings or arrays are the only patterns needed.

Publicaties

See http://eprints.eemcs.utwente.nl/view/project/LIL.html.

Gebruikers

Five companies are involved in this project.

Projectleider

Dr.ir. L. Abelmann
Universiteit Twente
MESA+ Research Institute for Nanotechnology
Transducers, Science and Technology (TST)
Postbus 217
7500 AE ENSCHEDE

Status van het project

Startdatum:	01-11-2001
Einddatum:	01-02-2008

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